Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
Анотація
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio.
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Теми
Low temperature plasma and plasma technologies
Цитування
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ.