Electrical and optical parameters of Cu₆PS₅I-based thin films deposited using magnetron sputtering

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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України

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Cu₆PS₅I-based thin films were deposited onto silicate glass substrates by nonreactive radio-frequency magnetron sputtering. The chemical composition of thin films was determined using energy-dispersive X-ray spectroscopy. Electrical conductivity of Cu₆PS₅I-based thin films was studied as dependent on chemical composition. Optical transmission spectra of Cu₅.₄₆P₁.₆₈S₅.₀₆I₀.₈₀ thin film were investigated within the temperature interval 77…300 K; temperature behaviour of optical absorption spectra and dispersion of the refractive index were also studied. Temperature dependences of the energy position of absorption edge, Urbach energy and refractive index of Cu₅.₄₆P₁.₆₈S₅.₀₆I₀.₈₀ thin film have been analyzed.

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Electrical and optical parameters of Cu₆PS₅I-based thin films deposited using magnetron sputtering / I.P. Studenyak, A.V. Bendak, V.Yu. Izai, P.P. Guranich, P. Kúš, M. Mikula, B. Grančič, M. Zahoran, J. Greguš, A. Vincze, T. Roch, T. Plecenik // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 79-83. — Бібліогр.: 17 назв. — англ.

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