Investigation of structural perfection of SiC ingots grown by a sublimation method

dc.contributor.authorAvramenko, S.F.
dc.contributor.authorKiselev, V.S.
dc.contributor.authorValakh, M.Ya.
dc.contributor.authorVisotski, V.G.
dc.date.accessioned2017-05-27T16:29:13Z
dc.date.available2017-05-27T16:29:13Z
dc.date.issued1999
dc.description.abstractMonocrystalline SiC ingots were grown by a modified Lely method using 6H-SiC seed crystals with (0001) base plane. The crystal growth was carried out in the temperature range 2200-2500 ⁰C at Ar pressure from 2 to 40 mbar. The rate of growth varied between 0.3 and 1.5 mm/hour in the C-axis direction. At growth time of about 15 hours we obtained the ingots with 35 mm useful diameter. To determine the polytype composition of SiC ingots the Raman scattering technique was used. The structural defects were investigated by means of reflection and transmission light microscopy and by selective etching. In the best ingots the dislocation density did not exceed 102 cm⁻², the micropipe density - 10-20 cm⁻², and blocks were absent.uk_UA
dc.identifier.citationInvestigation of structural perfection of SiC ingots grown by a sublimation method / S.F. Avramenko, V.S. Kiselev, M.Ya. Valakh, V.G. Visotski // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 1. — С. 76-79. — Бібліогр.: 11 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS 81.05. C, D, E, G, H
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/117937
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleInvestigation of structural perfection of SiC ingots grown by a sublimation methoduk_UA
dc.typeArticleuk_UA

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