Laser Thomson scattering diagnostics - developments and applications to high-temperature plasmas and plasmas for industrial applications

dc.contributor.authorMuraoka, Katsunori
dc.date.accessioned2015-05-28T18:57:01Z
dc.date.available2015-05-28T18:57:01Z
dc.date.issued2006
dc.description.abstractLaser Thomson scattering was applied to plasma diagnostics almost as soon as laser was invented in 1960. The most important contribution of the technique to plasma physics and controlled fusion came from the confirmation of good confinement of plasmas in the T-3 tokamak in 1968, by a collaboration of Russian and British physicists. Since then, extensive developments of the technique have been made to meet various measurement requirements, not only in hightemperature plasmas but in plasmas for industrial applications. In this article, these developments are briefly reviewed, followed by the work of the author and its implications for understanding various plasma phenomena.uk_UA
dc.description.sponsorshipThe author wishes to thank those who have contributed various phases of the work described in this article. This work has been supported by a grant from the High-Tech Research Center Establishment Project from the Ministry of Education, Culture, Sports, Science and Technology of Japan.uk_UA
dc.identifier.citationLaser Thomson scattering diagnostics - developments and applications to high-temperature plasmas and plasmas for industrial applications / Katsunori Muraoka // Вопросы атомной науки и техники. — 2006. — № 6. — С. 236-240. — Бібліогр.: 18 назв. — англ.uk_UA
dc.identifier.issn1562-6016
dc.identifier.otherPACS: 52.70.-m,52.70.Kz
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/82352
dc.language.isoenuk_UA
dc.publisherНаціональний науковий центр «Харківський фізико-технічний інститут» НАН Україниuk_UA
dc.relation.ispartofВопросы атомной науки и техники
dc.statuspublished earlieruk_UA
dc.subjectPlasma diagnosticsuk_UA
dc.titleLaser Thomson scattering diagnostics - developments and applications to high-temperature plasmas and plasmas for industrial applicationsuk_UA
dc.typeArticleuk_UA

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