Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique
dc.contributor.author | Golub, A.S. | |
dc.contributor.author | Lenenko, N.D. | |
dc.contributor.author | Novikov, Yu.N. | |
dc.contributor.author | Rumyantsev, B.M. | |
dc.contributor.author | Bibikov, S.B. | |
dc.contributor.author | Zhuravleva, T.S. | |
dc.date.accessioned | 2018-06-14T13:34:16Z | |
dc.date.available | 2018-06-14T13:34:16Z | |
dc.date.issued | 2006 | |
dc.description.abstract | New nanocomposite compounds containing alternating layers of molybdenum disulfide and organic compound (dyes, polyvinyl alcohol) have been synthesized using sigle-layer dispersions obtained by exfoliation of bulk MoS₂ crystals. The formation mechanism of those compounds as weel as their structure are discussed. The data on photoelectric sensitivity of the system consisting of MoS₂-polyvinyl alcohol nanocomposite and some photoconductive polymers are reported. | uk_UA |
dc.identifier.citation | Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique / A.S. Golub, N.D. Lenenko, Yu.N. Novikov, B.M. Rumyantsev, S.B. Bibikov, T.S. Zhuravleva // Functional Materials. — 2006. — Т. 13, № 3. — С. 502-506. — Бібліогр.: 11 назв. — англ. | uk_UA |
dc.identifier.issn | 1027-5495 | |
dc.identifier.uri | https://nasplib.isofts.kiev.ua/handle/123456789/135030 | |
dc.language.iso | en | uk_UA |
dc.publisher | НТК «Інститут монокристалів» НАН України | uk_UA |
dc.relation.ispartof | Functional Materials | |
dc.status | published earlier | uk_UA |
dc.title | Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique | uk_UA |
dc.title.alternative | Складання фоточутливих органіко-неорганічних нанокомпозитів на основі MoS₂ методом розшатування-перепакування | uk_UA |
dc.type | Article | uk_UA |
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