Relaxation of photodarkening in SiO-As₂(S,Se)₃ composite layers

dc.contributor.authorIndutnyi, I.Z.
dc.contributor.authorShepeliavyi, P.E.
dc.contributor.authorIndutnyi, V.I.
dc.date.accessioned2017-06-10T07:46:21Z
dc.date.available2017-06-10T07:46:21Z
dc.date.issued1999
dc.description.abstractInvestigated in this work is the reversible photostimulated red absorption edge shift (photodarkening), ∆Eg, of As₂(S,Se)₃ nanoparticles embedded into the SiO matrix. As compared to continuous chalcogenide films, the remarkable ∆Eg increase (up to 4 times) with decreasing of chalcogenide particle sizes in composite SiO-As₂(S,Se)₃ layers was revealed. The exponential dependence of ∆Eg on storing time at different temperatures has been obtained. An activation energy of the transition of A₂2S₃ nanoparticles structure from a metastable photoexposed state to a ground annealed state is equal to 0.78 ± 0.06 eV. The effects are related to a spatial confinement of a photoexcited carrier diffusion length and an influence of particle sizes on intermediate-range order scale structure relaxation in the chalcogenide nanoparticles.uk_UA
dc.identifier.citationRelaxation of photodarkening in SiO-As₂(S,Se)₃ composite layers / I.Z. Indutnyi, P.E. Shepeliavyi, V.I. Indutnyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 59-62. — Бібліогр.: 11 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS 78.66J,F, 81.15, 78.40.P, 73.61.J, 73.50.M
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/119861
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleRelaxation of photodarkening in SiO-As₂(S,Se)₃ composite layersuk_UA
dc.typeArticleuk_UA

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