Relaxation of photodarkening in SiO-As₂(S,Se)₃ composite layers
| dc.contributor.author | Indutnyi, I.Z. | |
| dc.contributor.author | Shepeliavyi, P.E. | |
| dc.contributor.author | Indutnyi, V.I. | |
| dc.date.accessioned | 2017-06-10T07:46:21Z | |
| dc.date.available | 2017-06-10T07:46:21Z | |
| dc.date.issued | 1999 | |
| dc.description.abstract | Investigated in this work is the reversible photostimulated red absorption edge shift (photodarkening), ∆Eg, of As₂(S,Se)₃ nanoparticles embedded into the SiO matrix. As compared to continuous chalcogenide films, the remarkable ∆Eg increase (up to 4 times) with decreasing of chalcogenide particle sizes in composite SiO-As₂(S,Se)₃ layers was revealed. The exponential dependence of ∆Eg on storing time at different temperatures has been obtained. An activation energy of the transition of A₂2S₃ nanoparticles structure from a metastable photoexposed state to a ground annealed state is equal to 0.78 ± 0.06 eV. The effects are related to a spatial confinement of a photoexcited carrier diffusion length and an influence of particle sizes on intermediate-range order scale structure relaxation in the chalcogenide nanoparticles. | uk_UA |
| dc.identifier.citation | Relaxation of photodarkening in SiO-As₂(S,Se)₃ composite layers / I.Z. Indutnyi, P.E. Shepeliavyi, V.I. Indutnyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 59-62. — Бібліогр.: 11 назв. — англ. | uk_UA |
| dc.identifier.issn | 1560-8034 | |
| dc.identifier.other | PACS 78.66J,F, 81.15, 78.40.P, 73.61.J, 73.50.M | |
| dc.identifier.uri | https://nasplib.isofts.kiev.ua/handle/123456789/119861 | |
| dc.language.iso | en | uk_UA |
| dc.publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України | uk_UA |
| dc.relation.ispartof | Semiconductor Physics Quantum Electronics & Optoelectronics | |
| dc.status | published earlier | uk_UA |
| dc.title | Relaxation of photodarkening in SiO-As₂(S,Se)₃ composite layers | uk_UA |
| dc.type | Article | uk_UA |
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