Plasma sterilization in low-pressure RF discharge
dc.contributor.author | Lisovskiy, V.A. | |
dc.contributor.author | Yakovin, S.D. | |
dc.contributor.author | Yegorenkov, V.D. | |
dc.contributor.author | Terent’eva, A.G. | |
dc.date.accessioned | 2015-05-18T12:48:38Z | |
dc.date.available | 2015-05-18T12:48:38Z | |
dc.date.issued | 2000 | |
dc.description.abstract | The present paper clarifies the conditions under which the process of plasma sterilization of medical tools may be efficiently performed in the RF capacitive gas discharge of low pressure in air. Experiments were performed with a number of gram-positive and gram-negative bacteria as well as with fungi. The process of sterilization in the RF discharge is shown to possess a threshold pattern. Probably the bombardment of bacteria with positive ions and hot molecules of the neutral gas is the main sterilizing factor in the low pressure RF discharge, and the UV radiation of plasma plays the auxiliary role. | uk_UA |
dc.identifier.citation | Plasma sterilization in low-pressure RF discharge / V.A. Lisovskiy, S.D. Yakovin, V.D. Yegorenkov, A.G. Terent’eva // Вопросы атомной науки и техники. — 2000. — № 1. — С. 77-81. — Бібліогр.: 14 назв. — англ. | uk_UA |
dc.identifier.issn | 1562-6016 | |
dc.identifier.udc | 533.9 | |
dc.identifier.uri | https://nasplib.isofts.kiev.ua/handle/123456789/81613 | |
dc.language.iso | en | uk_UA |
dc.publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України | uk_UA |
dc.relation.ispartof | Вопросы атомной науки и техники | |
dc.status | published earlier | uk_UA |
dc.subject | Газовый рaзряд, ППР и их применения | uk_UA |
dc.title | Plasma sterilization in low-pressure RF discharge | uk_UA |
dc.type | Article | uk_UA |
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