Method of low-temperature rise of laser diode quality

dc.contributor.authorKamuz, A.M.
dc.contributor.authorOleksenko, P.Ph.
dc.contributor.authorKamuz, O.A.
dc.contributor.authorKamuz, V.G.
dc.date.accessioned2017-06-14T07:41:08Z
dc.date.available2017-06-14T07:41:08Z
dc.date.issued2002
dc.description.abstractIn 1987 the authors of this article discovered the effect of irreversible gigantic modification (IGM) of semiconductors. Basing on the IGM phenomenon the authors have developed technological method that enables to considerably improve performances of laser diodes after their manufacturing by increasing power, slope efficiency, and decreasing threshold current. The technology has been tested on the laser diodes of several US companies. We obtained the same results in improvement of all the diodes from these companies. Performances of the laser diodes with small slope efficiency and high threshold current were improved using this modification. Slope efficiency of laser diodes was increased by 2.3 or 3.7 times and the threshold current was decreased from 15 % up to 29 %. It is shown that modification depth of the semiconductor chip for these laser diodes exceeds 50 microns. Shown is that a beam divergence of laser diode can be decreased using the irreversible gigantic modification.uk_UA
dc.identifier.citationMethod of low-temperature rise of laser diode quality / A.M. Kamuz, P.Ph. Oleksenko, O.A. Kamuz, V.G. Kamuz // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 4. — С. 406-411. — Бібліогр.: 4 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS: 42.55.Px, 85.60.Jb
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/121344
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleMethod of low-temperature rise of laser diode qualityuk_UA
dc.typeArticleuk_UA

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