Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films

Indutnyy, I.Z.; Lysenko, V.S.; Min'ko, V.I.; Nazarov, A.N.; Tkachenko, A.S.; Shepeliavyi, P.E.; Dan'ko, V.A.; Maidanchuk, I.Yu.

Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films

dc.contributor.author	Indutnyy, I.Z.
dc.contributor.author	Lysenko, V.S.
dc.contributor.author	Min'ko, V.I.
dc.contributor.author	Nazarov, A.N.
dc.contributor.author	Tkachenko, A.S.
dc.contributor.author	Shepeliavyi, P.E.
dc.contributor.author	Dan'ko, V.A.
dc.contributor.author	Maidanchuk, I.Yu.
dc.date.accessioned	2017-06-14T17:12:09Z
dc.date.available	2017-06-14T17:12:09Z
dc.date.issued	2006
dc.description.abstract	Effect of hydrogen radiofrequency plasma and chemical treatment on photoluminescence (PL) spectra of SiOx layers containing Si nanoparticles are investigated. Considerable PL intensity growth in the samples containing Si nanocrystals (nc-Si-SiOx) after plasma treatment is observed. The process saturates for time of 15 minutes. Chemical treatment in ammonia and acetone vapour before thermal annealing of SiOx layers leads to the considerable changes in PL spectra effecting both on the band shape and on the intensity. The possibility of controlled changes in PL spectra in nc-Si-SiO₂ layers is shown.	uk_UA
dc.identifier.citation	Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films / I.Z. Indutnyy, V.S. Lysenko, I.Yu. Maidanchuk, V.I. Min'ko, A.N. Nazarov, A.S. Tkachenko, P.E. Shepeliavyi, V.A. Dan'ko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 8, № 1. — С. 9-13. — Бібліогр.: 18 назв. — англ.	uk_UA
dc.identifier.issn	1560-8034
dc.identifier.other	PACS 78.66.Jg
dc.identifier.uri	https://nasplib.isofts.kiev.ua/handle/123456789/121580
dc.language.iso	en	uk_UA
dc.publisher	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України	uk_UA
dc.relation.ispartof	Semiconductor Physics Quantum Electronics & Optoelectronics
dc.status	published earlier	uk_UA
dc.title	Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films	uk_UA
dc.type	Article	uk_UA

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Semicond. Physics Quantum Electronics & Optoelectronics, 2006, № 1