Electrophysical properties of meso-porous silicon free standing films modified with palladium

dc.contributor.authorManilov, A.I.
dc.contributor.authorSkryshevsky, V.A.
dc.contributor.authorAlekseev, S.A.
dc.contributor.authorKuznetsov, G.V.
dc.date.accessioned2017-05-25T15:58:28Z
dc.date.available2017-05-25T15:58:28Z
dc.date.issued2011
dc.description.abstractResistivity and complex impedance voltage dependences for thick mesoporous silicon free layers were studied in this work. The asymmetrical by the sign of applied voltage experimental curves at low frequencies have been obtained. Modification of electrophysical properties due to introduction of palladium particles into the porous matrix is observed. Impedance change regularities during oxidation of the samples have been measured. The explanation of experimental results by asymmetrical distribution of charge carrier traps in the bulk of porous silicon has been suggested. Energy band diagrams and charge transfer mechanisms of these heterostructures are discussed.uk_UA
dc.identifier.citationElectrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS 61.72.uf, 72.80.Cw, 73.61.Cw
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/117603
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleElectrophysical properties of meso-porous silicon free standing films modified with palladiumuk_UA
dc.typeArticleuk_UA

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