Electron attachment to atomic hydrogen on the surface of liquid ⁴He

dc.contributor.authorArai, T.
dc.contributor.authorYayama, H.
dc.contributor.authorKono, K.
dc.date.accessioned2017-05-18T11:14:15Z
dc.date.available2017-05-18T11:14:15Z
dc.date.issued2008
dc.description.abstractWe demonstrate a possibility that helium surface electrons at cryogenic temperatures can be used as a new source of very low energy electrons. Since both electrons (e¯) and hydrogen atoms (H) are bound on liquid helium surface, two-dimensional mixture gas of these two species is available on the surface. We found that low energy collision of e¯ and H drives electron attachment to form a negative hydrogen ion (H¯) in the mixture. From our temperature dependence measurement of the reaction rate, it was found that another H atom participate in the reaction. Namely, the reaction is expressed as H + H + e¯ → H¯ + H. Possible reaction mechanisms are discussed in terms of direct three-body process and dissociative attachment process. Measurements in applied magnetic field (B) show that the reaction rate coefficient is suppressed as ~ B⁻². This implies that electron spin singlet collision is relevant for electron attachment.uk_UA
dc.description.sponsorshipThis work has been supported by President’s Special Research Grant of RIKEN, Grant-in-Aid for Scientific Research (B) from JSPS and Grant-in-Aid for Exploratory Research from MEXT. We thank T. Shiino and T. Mitsui for partial collaboration. We are grateful to A. Wrl and P. Leiderer for VCE installation and valuable discussions. We are grateful to T. Kumada for informing us the charge-induced dipole interaction. This work was carried out under the Joint Research Program of the Institute for Solid State Physics, University of Tokyo.uk_UA
dc.identifier.citationElectron attachment to atomic hydrogen on the surface of liquid ⁴He / T. Arai, H. Yayama, K. Kono // Физика низких температур. — 2008. — Т. 34, № 4-5. — С. 496–503. — Бібліогр.: 28 назв. — англ.uk_UA
dc.identifier.issn0132-6414
dc.identifier.otherPACS: 67.63.Gh;67.25.–k;68.03–g
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/116927
dc.language.isoenuk_UA
dc.publisherФізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН Україниuk_UA
dc.relation.ispartofФизика низких температур
dc.statuspublished earlieruk_UA
dc.subjectЭлектроны над жидким гелиемuk_UA
dc.titleElectron attachment to atomic hydrogen on the surface of liquid ⁴Heuk_UA
dc.typeArticleuk_UA

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