Polishing of AlN/sapphire substrates obtained by thermochemical nitridation of sapphire

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dc.contributor.authorVovk, E.A.
dc.contributor.authorBudnikov, A.T.
dc.contributor.authorNizhankovskyi, S.V.
dc.contributor.authorKryvonogov, S.I.
dc.contributor.authorKrukhmalev, A.A.
dc.contributor.authorDobrotvorskaya, M.V.
dc.date.accessioned2017-06-11T05:45:05Z
dc.date.available2017-06-11T05:45:05Z
dc.date.issued2013
dc.description.abstractPhysicochemical conditions and polishing suspension composition were established for polishing of AlN/sapphire templates obtained by thermochemical nitridation of sapphire. The use of the polishing suspension based on aerosil and KOH with pH 10.3 allowed to prepare the surface with a roughness Ra up to 1 nm. The morphology and element composition of AlN/sapphire surface at layer-by-layer removal of the nitridated layer were studied by the methods of atomic force microscopy and X-ray photoelectronic spectroscopy.uk_UA
dc.identifier.citationPolishing of AlN/sapphire substrates obtained by thermochemical nitridation of sapphire / E.A. Vovk, A.T. Budnikov, S.V. Nizhankovskyi, S.I. Kryvonogov, A.A. Krukhmalev, M.V. Dobrotvorskaya // Functional Materials. — 2013. — Т. 20, № 2. — С. 253-258. — Бібліогр.: 10 назв. — англ.uk_UA
dc.identifier.issn1027-5495
dc.identifier.otherDOI: dx.doi.org/10.15407/fm20.02.253
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/120073
dc.language.isoenuk_UA
dc.publisherНТК «Інститут монокристалів» НАН Україниuk_UA
dc.relation.ispartofFunctional Materials
dc.statuspublished earlieruk_UA
dc.subjectTechnologyuk_UA
dc.titlePolishing of AlN/sapphire substrates obtained by thermochemical nitridation of sapphireuk_UA
dc.typeArticleuk_UA

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Functional Materials, 2013, № 2