Characterization of grain boundaries in CdTe polycrystalline films

dc.contributor.authorTetyorkin, V.V.
dc.contributor.authorSukach, A.V.
dc.contributor.authorBoiko, V.A.
dc.contributor.authorTkachuk, A.I.
dc.date.accessioned2017-06-13T18:28:44Z
dc.date.available2017-06-13T18:28:44Z
dc.date.issued2015
dc.description.abstractCdTe polycrystalline films with the average size of grains within the range 10…360 μm were grown on sapphire substrates by using the modified close-spaced sublimation technique. Transverse (across the film) and lateral (along the film’s surface) conductivity as a function of bias voltage and temperature were measured using appropriate arrangement of contacts. The transverse conductivity exhibits ohmic behavior, whereas the lateral transport of carriers is dominated by potential barriers at the grain boundaries. The carrier concentration in the grains and the potential barrier height have been estimated. The inhomogeneous distribution of deep defects through the grains was found from the photoluminescence measurements.uk_UA
dc.identifier.citationCharacterization of grain boundaries in CdTe polycrystalline films / V.V. Tetyorkin, A.V. Sukach, V.A. Boiko, A.I. Tkachuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 428-432. — Бібліогр.: 31 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherDOI: 10.15407/spqeo18.04.428
dc.identifier.otherPACS 73.40.-c, 73.61.Ga, 78.30.Fs, 78.55.Et
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/121269
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleCharacterization of grain boundaries in CdTe polycrystalline filmsuk_UA
dc.typeArticleuk_UA

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