The distribution of field-induced charges in C₆₀ fullerite

dc.contributor.authorKuprievich, V.A.
dc.contributor.authorKapitanchuk, O.L.
dc.contributor.authorShramko, O.V.
dc.contributor.authorKudritska, Z.G.
dc.date.accessioned2017-06-10T19:51:57Z
dc.date.available2017-06-10T19:51:57Z
dc.date.issued2006
dc.description.abstractThe profile of injected charges in a C₆₀-based field-effect transistor (FET) is considered. A simple scheme for calculations of the charge distribution between the 2D layers of C₆₀ molecules is founded on a small magnitude of the interball electron hopping. Analytical solutions of the equations for the charge distributions are obtained in the limits of thick and thin crystals. The charge density is shown to drop exponentially with the crystal depth. The calculations predict the relative part of induced charges involved in the surface layer to be 3/4 and 2/3 in the cases of electron and hole injection, respectively.uk_UA
dc.description.sponsorshipThe authors are thankful to Prof. V. Loktev and Prof. E. Petrov for useful discussions. This work was partially supported under contract of the Ukrainian Scientific Program «Nanostructures, Nanomaterials and Nanotechnologies» (project No. 8/05—H).uk_UA
dc.identifier.citationThe distribution of field-induced charges in C₆₀ fullerite / V.A. Kuprievich, O.L. Kapitanchuk, O.V. Shramko, Z.G. Kudritska // Физика низких температур. — 2006. — Т. 32, № 1. — С. 125-128. — Бібліогр.: 16 назв. — рос.uk_UA
dc.identifier.issn0132-6414
dc.identifier.otherPACS: 71.10.–w, 31.25.Eb, 73.90.+f
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/120055
dc.language.isoenuk_UA
dc.publisherФізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН Україниuk_UA
dc.relation.ispartofФизика низких температур
dc.statuspublished earlieruk_UA
dc.subjectНизкоразмерные и неупорядоченные системыuk_UA
dc.titleThe distribution of field-induced charges in C₆₀ fulleriteuk_UA
dc.typeArticleuk_UA

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