Perspectives for using technology of laser thermolithography

dc.contributor.authorKryuchyn, A.A.
dc.contributor.authorLapchuk, A.S.
dc.contributor.authorBryts’kyi, A.I.
dc.contributor.authorKostyukevych, S.O.
dc.date.accessioned2017-05-31T05:17:12Z
dc.date.available2017-05-31T05:17:12Z
dc.date.issued2012
dc.description.abstractAnalyzed in this work are the requirements to an optical system for laser thermolithographic recording. It has been shown that possibilities of this type recording with decreasing the registered element sizes can be realized only when using special measures for stabilizing both exposing radiation power and duration of laser pulses. Using the thermolithographic method for making super-dense patterns also requires creation of a specific system for dynamic focusing with accuracy better than 100 nm. It has been shown that the specific heat of thermochemical reaction and thermal resistance of a substrate are critical parameters for this method.uk_UA
dc.identifier.citationPerspectives for using technology of laser thermolithography / A.A. Kryuchyn, A.S. Lapchuk, A.I. Bryts’kyi, S.O. Kostyukevych // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 328-332. — Бібліогр.: 9 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS 81.16.Nd
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/118722
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titlePerspectives for using technology of laser thermolithographyuk_UA
dc.typeArticleuk_UA

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