Degradation of phenolic compounds in water by non-thermal plasma treatment
dc.contributor.author | Hsu-Hui Cheng | |
dc.contributor.author | Shiao-Shing Chen | |
dc.contributor.author | Kazuharu Yoshizuka | |
dc.contributor.author | Yung-Chih Chen | |
dc.date.accessioned | 2018-02-19T20:33:47Z | |
dc.date.available | 2018-02-19T20:33:47Z | |
dc.date.issued | 2012 | |
dc.description.abstract | A stainless-steel hollow needle type anode was used in the reactor to treat industrial wastewater by gas-liquid phase non-thermal plasma by corona discharge. The results showed that the short electrode gap, 1 cm, has a higher plasma energy density which improves the removal of the phenolic derivatives, reaching 100% after about 60 min. The H₂O₂ concentration was higher in the discharge system when the content of oxygen was increased. The efficiency of the phenol removal by chemical oxygen demand was only 10 – 31% after 60 minutes. The identifie dinterme diates were catechol, hydroquinone,1,4-benzoquinone, 2-nitrophenol,1,2-benzenedicarboxylic acid, diphenylmethanone, 2-methyl-hydroquinone, 2-methyl-1,4-bezoquinone, and trace amounts of organic. | uk_UA |
dc.identifier.citation | Degradation of phenolic compounds in water by non-thermal plasma treatment / Hsu-Hui Cheng, Shiao-Shing Chen, Kazuharu Yoshizuka, Yung-Chih Chen // Химия и технология воды. — 2012. — Т. 34, № 4. — С. 304-319. — Бібліогр.: 24 назв. — англ. | uk_UA |
dc.identifier.issn | 0204-3556 | |
dc.identifier.uri | https://nasplib.isofts.kiev.ua/handle/123456789/130717 | |
dc.language.iso | en | uk_UA |
dc.publisher | Інститут колоїдної хімії та хімії води ім. А.В. Думанського НАН України | uk_UA |
dc.relation.ispartof | Химия и технология воды | |
dc.status | published earlier | uk_UA |
dc.subject | Физическая химия процессов обработки воды | uk_UA |
dc.title | Degradation of phenolic compounds in water by non-thermal plasma treatment | uk_UA |
dc.type | Article | uk_UA |
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