Degradation of phenolic compounds in water by non-thermal plasma treatment

dc.contributor.authorHsu-Hui Cheng
dc.contributor.authorShiao-Shing Chen
dc.contributor.authorKazuharu Yoshizuka
dc.contributor.authorYung-Chih Chen
dc.date.accessioned2018-02-19T20:33:47Z
dc.date.available2018-02-19T20:33:47Z
dc.date.issued2012
dc.description.abstractA stainless-steel hollow needle type anode was used in the reactor to treat industrial wastewater by gas-liquid phase non-thermal plasma by corona discharge. The results showed that the short electrode gap, 1 cm, has a higher plasma energy density which improves the removal of the phenolic derivatives, reaching 100% after about 60 min. The H₂O₂ concentration was higher in the discharge system when the content of oxygen was increased. The efficiency of the phenol removal by chemical oxygen demand was only 10 – 31% after 60 minutes. The identifie dinterme diates were catechol, hydroquinone,1,4-benzoquinone, 2-nitrophenol,1,2-benzenedicarboxylic acid, diphenylmethanone, 2-methyl-hydroquinone, 2-methyl-1,4-bezoquinone, and trace amounts of organic.uk_UA
dc.identifier.citationDegradation of phenolic compounds in water by non-thermal plasma treatment / Hsu-Hui Cheng, Shiao-Shing Chen, Kazuharu Yoshizuka, Yung-Chih Chen // Химия и технология воды. — 2012. — Т. 34, № 4. — С. 304-319. — Бібліогр.: 24 назв. — англ.uk_UA
dc.identifier.issn0204-3556
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/130717
dc.language.isoenuk_UA
dc.publisherІнститут колоїдної хімії та хімії води ім. А.В. Думанського НАН Україниuk_UA
dc.relation.ispartofХимия и технология воды
dc.statuspublished earlieruk_UA
dc.subjectФизическая химия процессов обработки водыuk_UA
dc.titleDegradation of phenolic compounds in water by non-thermal plasma treatmentuk_UA
dc.typeArticleuk_UA

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