Vacuum-arc equipment for ion-plasma deposition of coatings
dc.contributor.author | Aksenov, I.I. | |
dc.contributor.author | Belous, V.A. | |
dc.date.accessioned | 2015-05-29T07:42:11Z | |
dc.date.available | 2015-05-29T07:42:11Z | |
dc.date.issued | 2000 | |
dc.description.abstract | A brief overview of NSC KIPT developments intended for creating the process equipment for vacuum-arc deposition of coatings is presented. The equipment devised is to be adapted to large-scale manufacture conditions and to be most suitable for commercial production. Consideration is given to the developments of high-efficiency butt-end plasma sources, vacuum-arc evaporators with extended (cylindrical and planar) cathodes, magnetic filters for removal of macroparticles from plasma, and also a number of devices to form various-purpose coatings. | uk_UA |
dc.identifier.citation | Vacuum-arc equipment for ion-plasma deposition of coatings / I.I. Aksenov, V.A. Belous // Вопросы атомной науки и техники. — 2000. — № 3. — С. 156-158. — Бібліогр.: 9 назв. — англ. | uk_UA |
dc.identifier.issn | 1562-6016 | |
dc.identifier.udc | 533.9 | |
dc.identifier.uri | https://nasplib.isofts.kiev.ua/handle/123456789/82381 | |
dc.language.iso | en | uk_UA |
dc.publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України | uk_UA |
dc.relation.ispartof | Вопросы атомной науки и техники | |
dc.status | published earlier | uk_UA |
dc.subject | Low Temperature Plasma and Plasma Technologies | uk_UA |
dc.title | Vacuum-arc equipment for ion-plasma deposition of coatings | uk_UA |
dc.type | Article | uk_UA |
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