Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu₆PS₅I-based thin films deposited using magnetron sputtering
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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Cu₆PS₅I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, and their chemical composition was determined using energy-dispersive X-ray spectroscopy. As-deposited thin films were irradiated with wideband radiation of a Cu-anode X-ray tube at different exposure times. Optical transmission spectra of X-ray irradiated Cu₅.₅₆P1.₆₆S₄.₉₃I₀.₈₅ thin films were measured depending on irradiation time. The Urbach absorption edge and dispersion of refractive index for X-rays irradiated Cu₅.₅₆P1.₆₆S₄.₉₃I₀.₈₅ thin films were studied. It has been revealed that the nonlinear decrease of energy pseudogap and the nonlinear increase of refractive index occur with the increase of X-ray irradiation time.
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Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu₆PS₅I-based thin films deposited using magnetron sputtering / I.P. Studenyak, M.M. Kutsyk, A.V. Bendak, V. Yu. Izai, P. Kus, M. Mikula // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 2. — С. 246-249. — Бібліогр.: 12 назв. — англ.