Growing the high-resistive Cd₁₋xZnxTe single crystals from a vapor phase

dc.contributor.authorFeychuk, P.
dc.contributor.authorKopyl, O.
dc.contributor.authorPavlovich, I.
dc.contributor.authorShcherbak, L.
dc.date.accessioned2017-06-19T12:44:18Z
dc.date.available2017-06-19T12:44:18Z
dc.date.issued2005
dc.description.abstractA modified vapor phase growth method to obtain high-resistive Cd1-xZnxTe single crystals (0 < x < 0.13) is presented. The single crystals (about 25 cm⁻³ in size) with natural faceting were grown by vapor transport in silica ampoules with a special shape using a polycrystalline ingot as initial source material. It is shown that minimization of plastic deformation effect in preparation of the most structurally perfect crystals is possible by a way of heat removal from the crystallization front by radiation. The growth of high-resistive material required careful preparation of the initial charge with close to stoichiometric composition. The obtained crystals were successfully tested for creating the room temperature X-ray and gamma-ray detectors.uk_UA
dc.identifier.citationGrowing the high-resistive Cd₁₋xZnxTe single crystals from a vapor phase / P. Feychuk, O. Kopyl, I. Pavlovich, L. Shcherbak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 1. — С. 110-113. — Бібліогр.: 15 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS: 61.72y, 81.05, Dz; 81.10.Bk
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/121862
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleGrowing the high-resistive Cd₁₋xZnxTe single crystals from a vapor phaseuk_UA
dc.typeArticleuk_UA

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