Using ion beams for creation of nanostructures on the surface of high-stable materials

dc.contributor.authorGorbov, I.V.
dc.contributor.authorPetrov, V.V.
dc.contributor.authorKryuchyn, A.A.
dc.date.accessioned2017-05-26T05:44:31Z
dc.date.available2017-05-26T05:44:31Z
dc.date.issued2007
dc.description.abstractMain ion-beam etching techniques for creation of nanostructures on the surface of high-stable materials have been considered. Methods of information recording in the form of nanostructure on the metallic substrate surface have been analyzed. Application of glass substrate for creation long-term data carrier was proposed. Microrelief information record on the glass substrate surface was obtained using the ionbeam etching.uk_UA
dc.description.sponsorshipThe authors thank the staff of V. Lashkaryov Institute of Semiconductor Physics of NAS of Ukraine for their assistance in nanostructure measurements.uk_UA
dc.identifier.citationUsing ion beams for creation of nanostructures on the surface of high-stable materials / I.V. Gorbov, V.V. Petrov, A.A. Kryuchyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 1. — С. 27-29. — Бібліогр.: 5 назв. — англ.uk_UA
dc.identifier.issn1560-8034
dc.identifier.otherPACS 81.07.-b
dc.identifier.urihttps://nasplib.isofts.kiev.ua/handle/123456789/117660
dc.language.isoenuk_UA
dc.publisherІнститут фізики напівпровідників імені В.Є. Лашкарьова НАН Україниuk_UA
dc.relation.ispartofSemiconductor Physics Quantum Electronics & Optoelectronics
dc.statuspublished earlieruk_UA
dc.titleUsing ion beams for creation of nanostructures on the surface of high-stable materialsuk_UA
dc.typeArticleuk_UA

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